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Vol 54, No 1 (2025)

AZ nLOF series photoresist films on monocrystalline silicon

Brinkevich D.I., Grinyuk E.V., Prosolovich V.S., Zubova O.A., Kolos V.V., Brinkevich S.D., Vabishchevich S.A.

(Rus)

Vol 54, No 4 (2025)

MULTILAYER EPITAXIAL SILICON STRUCTURES WITH SUBMICRON LAYERS GROWN BY SUBLIMATION MOLECULAR BEAM EPITAXI

Shengurov V.G., Titova A.M., Alyabina N.A., Chalkov V.Y., Denisov S.A., Zdoroveyshchev A.V.

(Rus)

Vol 54, No 4 (2025)

Effect of rapid thermal annealing on the formation of aluminum-silicon and aluminum-polysilicon ohmic contacts in integrated microcircuits

Zhyhulin D.V., Pilipenko V.A., Shestovski D.V.

(Rus)

Vol 54, No 2 (2025)

Effect of boundary roughness on the variability of the I-V data of silicon field-effect GAA nanotransistors

Masalsky N.V.

(Rus)

Vol 53, No 4 (2024)

Al Islands on Si(111): Growth Temperature, Morphology and Strain

Lomov A.A., Zakharov D.M., Tarasov M.A., Chekushkin A.M., Tatarintsev A.A., Vasiliev A.L.

(Rus)

Vol 53, No 3 (2024)

Simulation of silicon conical field effect GAA nanotransistors with stack SiO2/HfO2 dielectric of gate

Masalsky N.V.

(Rus)

Vol 54, No 6 (2025)

STABILIZING PROCESSING OF NEGATIVE PHOTORESIST FILMS OF THE AZ nLOF20XX SERIES ON SILICON

Prosolovich V.S., Brinkevich D.I., Grinyuk E.V., Yankouski Y.N., Zubova O.A., Brinkevich S.D., Vabishchevich S.A.

(Rus)

Vol 53, No 2 (2024)

Influence of nickel impurities on the operational parameters of a silicon solar cell

Kenzhaev Z.T., Zikrillaev N.F., Odzhaev V.B., Ismailov K.A., Prosolovich V.S., Zikrillaev K.F., Koveshnikov S.V.

(Rus)

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Vol 54, No 5 (2025)

Processing of Silicon Carbide Plates with Bonded Diamond Tools

Kondratenko V.S., Isaev A.A., Kadomkin V.V., Biryukov G.M., Borodynkin I.I., Tambovsky A.D.

(Rus)

Vol 53, No 2 (2024)

Temporary changes in current flow mechanisms in erbium-doped porous silicon

Khamzin E.K., Uslin D.A.

(Rus)

Vol 53, No 2 (2024)

Structural features and electrical properties of si(al) thermal migration channels for high-voltage photovoltaic converters

Lomov A.A., Seredin B.M., Martyushov S.Y., Tatarintsev A.A., Popov V.P., Malibashev A.V.

(Rus)

Vol 52, No 4 (2023)

Simulation of Silicon FETs with a Fully Enclosed Gate with a High-k Gate Dielectric

Masalskii N.V.

(Rus)

Vol 52, No 1 (2023)

Controlling Silicon Etching Parameters in RF CHF3 Plasma by Optical Emission Spectroscopy

Murin D.B., Chesnokov I.A., Pivovarenok S.A., Efremov A.M.

(Rus)

1 - 13 of 13 Items

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Vol 54, No 6 (2025)

Vol 54, No 6 (2025)

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