作者的详细信息
Garmash, V. I.
期 | 栏目 | 标题 | 文件 |
卷 52, 编号 15 (2018) | Technological Processes and Routes | Investigating the RTA Treatment of Ohmic Contacts to n-Layers of Heterobipolar Nanoheterostructures | |
卷 53, 编号 15 (2019) | Technological Processes and Routes | Influence of the Metallization Composition and Annealing Process Parameters on the Resistance of Ohmic Contacts to n-type 6H-SiC |