Energy Expenditure Upon the Formation of the Elastically Stressed State in the Layers of a Step-Graded Metamorphic Buffer in a Heterostructure Grown on a (001) GaAs Substrate


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On the basis of data on X-ray structural analysis performed by the method of reciprocal-space mapping and investigations using secondary-ion mass spectrometry and transmission electron microscopy, it is shown that vertical compressive stresses also arise in a multilayer epitaxial heterostructure comprised of a step-graded metamorphic buffer along with lateral compressive stresses. The cause of the appearance of vertical stresses is the effect of interlayer hardening, which arises due to the deceleration of fragments of glide dislocations by interphase boundaries. Analysis performed within the framework of the linear theory of elasticity shows that the elastically stressed state of the buffer steps is similar to the state that can be achieved as a result of a two-stage deformation process: bulk and biaxial compression. Bulk compression leads to large energy expenditures in the formation of the structure of the buffer steps, which is reflected, in particular, in violation of the coherence between the dislocation-free and the underlying layers.

作者简介

A. Aleshin

Mokerov Institute of Ultrahigh Frequency Semiconductor Electronics, Russian Academy of Sciences

编辑信件的主要联系方式.
Email: a.n.aleshin@mail.ru
俄罗斯联邦, Moscow, 117105

A. Bugaev

Mokerov Institute of Ultrahigh Frequency Semiconductor Electronics, Russian Academy of Sciences

Email: a.n.aleshin@mail.ru
俄罗斯联邦, Moscow, 117105

O. Ruban

Mokerov Institute of Ultrahigh Frequency Semiconductor Electronics, Russian Academy of Sciences

Email: a.n.aleshin@mail.ru
俄罗斯联邦, Moscow, 117105

V. Saraikin

Mokerov Institute of Ultrahigh Frequency Semiconductor Electronics, Russian Academy of Sciences

Email: a.n.aleshin@mail.ru
俄罗斯联邦, Moscow, 117105

N. Tabachkova

National University of Science and Technology “MISiS“

Email: a.n.aleshin@mail.ru
俄罗斯联邦, Moscow, 119049

I. Shchetinin

National University of Science and Technology “MISiS“

Email: a.n.aleshin@mail.ru
俄罗斯联邦, Moscow, 119049


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