Annealing of FIB-Induced Defects in GaAs/AlGaAs Heterostructure
- 作者: Levitskii I.1, Mitrofanov M.1, Voznyuk G.2, Nikolaev D.1, Mizerov M.3, Evtikhiev V.1
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隶属关系:
- Ioffe Institute
- ITMO University
- Submicron Heterostructures for Microelectronics, Research and Engineering Center
- 期: 卷 52, 编号 14 (2018)
- 页面: 1898-1900
- 栏目: Lasers and Optoelectronic Devices
- URL: https://journals.rcsi.science/1063-7826/article/view/205146
- DOI: https://doi.org/10.1134/S1063782618140178
- ID: 205146
如何引用文章
详细
We present results of experiments concerning the loss of internal quantum efficiency of the GaAs/AlGaAs heterostructure due to the focused ion beam-induced radiation defects. Firstly we show that 300°C annealing in the high vacuum conditions leads to a partial recovery of the internal quantum efficiency and, therefore, photoluminescence regains some of its intensity. Secondly we show that 620°C annealing in the presence of As vapor leads up to 80% recovery of the internal quantum efficiency depending on the etching depth. Achieved results proves focused ion beam technique to be potent for the fabrication of photonic structures based on A3B5 materials containing active layer.
作者简介
I. Levitskii
Ioffe Institute
编辑信件的主要联系方式.
Email: levitskyar@gmail.com
俄罗斯联邦, St. Petersburg
M. Mitrofanov
Ioffe Institute
Email: levitskyar@gmail.com
俄罗斯联邦, St. Petersburg
G. Voznyuk
ITMO University
Email: levitskyar@gmail.com
俄罗斯联邦, St. Petersburg
D. Nikolaev
Ioffe Institute
Email: levitskyar@gmail.com
俄罗斯联邦, St. Petersburg
M. Mizerov
Submicron Heterostructures for Microelectronics, Research and Engineering Center
Email: levitskyar@gmail.com
俄罗斯联邦, St. Petersburg
V. Evtikhiev
Ioffe Institute
Email: levitskyar@gmail.com
俄罗斯联邦, St. Petersburg