Growth Modes of GaN Plasma-Assisted MBE Nanowires
- Авторы: Berdnikov Y.1, Sibirev N.2
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Учреждения:
- ITMO University
- St. Petersburg State University
- Выпуск: Том 52, № 16 (2018)
- Страницы: 2085-2087
- Раздел: 26th INTERNATIONAL SYMPOSIUM “NANOSTRUCTURES: PHYSICS AND TECHNOLOGY”. NANOSTRUCTURE TECHNOLOGY
- URL: https://journals.rcsi.science/1063-7826/article/view/205376
- DOI: https://doi.org/10.1134/S1063782618160042
- ID: 205376
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Аннотация
Within this work we study the plasma-assisted molecular beam epitaxy of GaN on Si(111) substrate at different substrate temperatures and III/V flux ratios. We present the model, which gives the analytical expressions for the boundaries between the three growth modes: compact layer, nanowires, and absence of growth. We extract the activation energy for nucleation of GaN nanowires on the Si(111) from the model fitting to experimental data.
Об авторах
Yu. Berdnikov
ITMO University
Автор, ответственный за переписку.
Email: yury.berdnikov@corp.ifmo.ru
Россия, St. Petersburg, 197101
N. Sibirev
St. Petersburg State University
Email: yury.berdnikov@corp.ifmo.ru
Россия, St. Petersburg, 198504