Decomposition of a Solid Solution of Interstitial Magnesium in Silicon
- Autores: Shuman V.1, Lodygin A.1, Portsel L.1, Yakovleva A.1, Abrosimov N.2, Astrov Y.1
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Afiliações:
- Ioffe Institute
- Leibniz Institute for Crystal Growth
- Edição: Volume 53, Nº 3 (2019)
- Páginas: 296-297
- Seção: Nonelectronic Properties of Semiconductors (Atomic Structure, Diffusion)
- URL: https://journals.rcsi.science/1063-7826/article/view/205810
- DOI: https://doi.org/10.1134/S1063782619030175
- ID: 205810
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Resumo
The decomposition of a solid solution of interstitial magnesium Mgi in silicon is studied. Float-Zone dislocation-free single-crystal n-Si with a resistivity of ~8 × 103 Ω cm and oxygen and carbon contents of ~5 × 1014 cm–3 and ~1 × 1015 cm–3 is used in the experiments. The samples are doped using the diffusion sandwich method at T =1100°C followed by quenching. Decomposition of the supersaturated Mgi solid solution is studied by observing the kinetics of increasing the resistivity of doped samples resulting from their annealing in the range T= 400–620°C. It is found that the decomposition is characterized by an activation energy of Ea ≈ 1.6 eV, which is close to the previously determined diffusion activation energy of Mgi in silicon. It is also shown that Si:Mg exhibits stable properties at temperatures not exceeding 400°C, which is important for its possible practical application.
Sobre autores
V. Shuman
Ioffe Institute
Email: a.lodygin@mail.ioffe.ru
Rússia, St. Petersburg, 194021
A. Lodygin
Ioffe Institute
Autor responsável pela correspondência
Email: a.lodygin@mail.ioffe.ru
Rússia, St. Petersburg, 194021
L. Portsel
Ioffe Institute
Email: a.lodygin@mail.ioffe.ru
Rússia, St. Petersburg, 194021
A. Yakovleva
Ioffe Institute
Email: a.lodygin@mail.ioffe.ru
Rússia, St. Petersburg, 194021
N. Abrosimov
Leibniz Institute for Crystal Growth
Email: a.lodygin@mail.ioffe.ru
Alemanha, 2 Max-Born-str., Berlin, 12489
Yu. Astrov
Ioffe Institute
Email: a.lodygin@mail.ioffe.ru
Rússia, St. Petersburg, 194021