Investigation of InGaAs/GaAs Quantum Well Lasers with Slightly Doped Tunnel Junction


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Resumo

We experimentally investigate and analyze the electrical and optical characteristics of InGaAs/GaAs conventional quantum well laser diode and the quantum well laser diode with slightly-doped tunnel junction. It was found that the laser with slightly-doped tunnel junction has a nonlinear S-shape current-voltage characteristic. The internal quantum efficiencies of the laser with slightly-doped tunnel junction and the conventional laser are 21 and 87.3%, respectively. This suggests that the slightly-doped tunnel junction increased the barrier width and free carrier absorption, thus could reduce the electron tunneling probability and increase the internal loss. Furthermore, compared with the conventional laser, it was found that we could achieve 15 nm broadband spectrum from the laser with slightly-doped tunnel junction, due to the lasing dynamics reflecting the current dynamics. The results show that the slightly-doped tunnel junction plays a crucial role in the laser diode performances, which may lead to the realization of more applications.

Sobre autores

Yajie Li

Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors,
Chinese Academy of Science; College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences

Email: jqpan@semi.ac.cn
República Popular da China, Beijing, 100083; Beijing, 100049

Pengfei Wang

Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors,
Chinese Academy of Science; College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences

Email: jqpan@semi.ac.cn
República Popular da China, Beijing, 100083; Beijing, 100049

Fangyuan Meng

Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors,
Chinese Academy of Science; College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences

Email: jqpan@semi.ac.cn
República Popular da China, Beijing, 100083; Beijing, 100049

Hongyan Yu

Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors,
Chinese Academy of Science

Email: jqpan@semi.ac.cn
República Popular da China, Beijing, 100083

Xuliang Zhou

Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors,
Chinese Academy of Science

Email: jqpan@semi.ac.cn
República Popular da China, Beijing, 100083

Huolei Wang

Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors,
Chinese Academy of Science; Department of Applied Physics and Materials Science, California Institute of Technology

Email: jqpan@semi.ac.cn
República Popular da China, Beijing, 100083; Pasadena, California, 91125

Jiaoqing Pan

Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors,
Chinese Academy of Science; College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences

Autor responsável pela correspondência
Email: jqpan@semi.ac.cn
República Popular da China, Beijing, 100083; Beijing, 100049


Declaração de direitos autorais © Pleiades Publishing, Ltd., 2018

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