InGaN/GaN light-emitting diode microwires of submillimeter length

W. V. Lundin; S. N. Rodin; A. V. Sakharov; E. Yu. Lundina; S. O. Usov; Yu. M. Zadiranov; S. I. Troshkov; A. F. Tsatsulnikov

doi:10.1134/S1063782617010122

InGaN/GaN light-emitting diode microwires of submillimeter length

Autores: Lundin W.¹, Rodin S.¹, Sakharov A.¹, Lundina E.¹, Usov S.², Zadiranov Y.¹, Troshkov S.¹, Tsatsulnikov A.²^,3
Afiliações:
1. Ioffe Physical–Technical Institute
2. Research and Engineering Center of Submicron Heterostructures for Microelectronics
3. St. Petersburg National Research University of Information Technologies, Mechanics, and Optics
Edição: Volume 51, Nº 1 (2017)
Páginas: 100-103
Seção: Fabrication, Treatment, and Testing of Materials and Structures
URL: https://journals.rcsi.science/1063-7826/article/view/199350
DOI: https://doi.org/10.1134/S1063782617010122
ID: 199350

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Microcrystalline wire-like InGaN/GaN light-emitting diodes designed as core–shell structures 400–600 μm in length are grown by metal–organic vapor-phase epitaxy on sapphire and silicon substrates. The technology of the titanium-nanolayer-induced ultrafast growth of nanowire and microwire crystals is used. As a current is passed through the microcrystals, an electroluminescence signal is observed in the blue–green spectral region.