Email this article Lithography and Plasma Treatment Effect on Conductivity of Carbon Nanotubes
- Authors: Mitin D.M.1,2, Raudik S.A.1, Mozharov A.M.3, Bolshakov A.D.1, Fedorov V.V.1, Nepokh V.V.1, Rajanna P.M.4, Nasibulin A.G.4, Mukhin I.S.1,3
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Affiliations:
- Saint Petersburg Academic University
- Ioffe Institute
- ITMO University
- Skolkovo Institute of Science and Technology
- Issue: Vol 53, No 14 (2019)
- Pages: 1926-1928
- Section: Nanostructures Characterization
- URL: https://journals.rcsi.science/1063-7826/article/view/207523
- DOI: https://doi.org/10.1134/S1063782619140148
- ID: 207523
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Abstract
Transparency and sheet resistance measurements of transferred CNT film on glass substrate were performed. Effect of optical lithography and plasma treatment processes on CNT film sheet resistance was analyzed. CNT film demonstrates good electrical conductivity and chemical stability to post-growth processing techniques. The maximum increase in the sheet resistance of the CNT film after optical lithography and plasma treatment processes is no more than 7%.
About the authors
D. M. Mitin
Saint Petersburg Academic University; Ioffe Institute
Author for correspondence.
Email: mitindm@mail.ru
Russian Federation, St. Petersburg, 194021; St. Petersburg, 194021
S. A. Raudik
Saint Petersburg Academic University
Author for correspondence.
Email: s.raudik@gmail.com
Russian Federation, St. Petersburg, 194021
A. M. Mozharov
ITMO University
Author for correspondence.
Email: mozharov@spbau.ru
Russian Federation, St. Petersburg, 197101
A. D. Bolshakov
Saint Petersburg Academic University
Author for correspondence.
Email: acr1235@mail.ru
Russian Federation, St. Petersburg, 194021
V. V. Fedorov
Saint Petersburg Academic University
Author for correspondence.
Email: vfedorov.fl@mail.ioffe.ru
Russian Federation, St. Petersburg, 194021
V. V. Nepokh
Saint Petersburg Academic University
Author for correspondence.
Email: vneplox@gmail.com
Russian Federation, St. Petersburg, 194021
P. M. Rajanna
Skolkovo Institute of Science and Technology
Author for correspondence.
Email: pramod.rajanna@skolkovotech.ru
Russian Federation, Moscow, 121205
A. G. Nasibulin
Skolkovo Institute of Science and Technology
Author for correspondence.
Email: a.nasibulin@skoltech.ru
Russian Federation, Moscow, 121205
I. S. Mukhin
Saint Petersburg Academic University; ITMO University
Author for correspondence.
Email: imukhin@yandex.ru
Russian Federation, St. Petersburg, 194021; St. Petersburg, 197101
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