Air-Oxidation of Nb Nano-Films

A. V. Lubenchenko; A. A. Batrakov; D. A. Ivanov; O. I. Lubenchenko; I. A. Lashkov; A. B. Pavolotsky; B. Schleicher; N. Albert; K. Nielsch

doi:10.1134/S1063782618050196

Air-Oxidation of Nb Nano-Films

Authors: Lubenchenko A.V.¹, Batrakov A.A.¹, Ivanov D.A.¹, Lubenchenko O.I.¹, Lashkov I.A.¹, Pavolotsky A.B.², Schleicher B.³, Albert N.³, Nielsch K.³
Affiliations:
1. National Research University MPEI
2. Chalmers University of Technology
3. IFW Dresden, Institute for Metallic Materials
Issue: Vol 52, No 5 (2018)
Pages: 678-682
Section: XXV International Symposium “Nanostructures: Physics and Technology”, Saint Petersburg, Russia, June 26–30, 2017. Nanostructure Technology
URL: https://journals.rcsi.science/1063-7826/article/view/203412
DOI: https://doi.org/10.1134/S1063782618050196
ID: 203412

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Abstract

X-ray photoelectron spectroscopy (XPS) depth chemical and phase profiling of air-oxidized niobium nanofilms has been performed. It is found that oxide layer thicknesses depend on the initial thickness of the niobium nanofilm. The increase in thickness of the initial Nb nano-layer is due to increase in thickness of an oxidized layer.