MBE growth and Structural Properties of InAs and InGaAs Nanowires with Different Mole Fraction of In on Si and Strongly Mismatched SiC/Si(111) Substrates


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Abstract

The possibility of InAs nanowires MBE growth on silicon (111) substrates with a nanometer buffer layer of silicon carbide has been demonstrated for the first time. The NWs diameter turned out to be smaller than on the silicon substrate—the minimum of NWs diameter was less than 10 nm. In addition, dependence of structural properties of InGaAs nanowires on composition was studied.

About the authors

R. R. Reznik

St. Petersburg Academic University Russian Academy of Sciences; ITMO University; Institute for Analytical Instrumentation Russian Academy of Sciences; Peter the Great Polytechnic University

Author for correspondence.
Email: moment92@mail.ru
Russian Federation, St. Petersburg, 194021; St. Petersburg, 197101; St. Petersburg, 190103; St. Petersburg, 195251

K. P. Kotlyar

St. Petersburg Academic University Russian Academy of Sciences

Email: moment92@mail.ru
Russian Federation, St. Petersburg, 194021

I. P. Soshnikov

St. Petersburg Academic University Russian Academy of Sciences; Institute for Analytical Instrumentation Russian Academy of Sciences

Email: moment92@mail.ru
Russian Federation, St. Petersburg, 194021; St. Petersburg, 190103

S. A. Kukushkin

Institute of Problems of Mechanical Engineering Russian Academy of Science

Email: moment92@mail.ru
Russian Federation, St. Petersburg, 199178

A. V. Osipov

Institute of Problems of Mechanical Engineering Russian Academy of Science

Email: moment92@mail.ru
Russian Federation, St. Petersburg, 199178

G. E. Cirlin

St. Petersburg Academic University Russian Academy of Sciences; ITMO University; Institute for Analytical Instrumentation Russian Academy of Sciences; Peter the Great Polytechnic University

Email: moment92@mail.ru
Russian Federation, St. Petersburg, 194021; St. Petersburg, 197101; St. Petersburg, 190103; St. Petersburg, 195251


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