Conditions of growth of high-quality relaxed Si1–xGex layers with a high Ge content by the vapor-phase decomposition of monogermane on a sublimating Si hot wire
- Authors: Shengurov V.G.1, Chalkov V.Y.1, Denisov S.A.1, Matveev S.A.2, Nezhdanov A.V.2, Mashin A.I.2, Filatov D.O.1, Stepikhova M.V.2,3, Krasilnik Z.F.2,3
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Affiliations:
- Physical Technical Research Institute
- Nizhny Novgorod State University
- Institute for Physics of Microstructures
- Issue: Vol 50, No 9 (2016)
- Pages: 1248-1253
- Section: Fabrication, Treatment, and Testing of Materials and Structures
- URL: https://journals.rcsi.science/1063-7826/article/view/197944
- DOI: https://doi.org/10.1134/S1063782616090220
- ID: 197944
Cite item
Abstract
The conditions of the epitaxial growth of high-quality relaxed Si1–xGex layers by the combined method of the sublimation molecular-beam epitaxy and vapor-phase decomposition of monogermane on a hot wire are considered. The combined growth procedure proposed provides a means for growing Si1–xGex layers with a thickness of up to 2 µm and larger. At reduced growth temperatures (TS = 325–350°C), the procedure allows the growth of Si1–xGex layers with a small surface roughness (rms ≈ 2 nm) and a low density of threading dislocations. The photoluminescence intensity of Si1–xGex:Er layers is significantly (more than five times) higher than the photoluminescence intensity of layers produced under standard growth conditions (TS ≈ 500°C) and possess an external quantum efficiency estimated at a level of ~0.4%.
About the authors
V. G. Shengurov
Physical Technical Research Institute
Email: matveevsa.sou@gmail.com
Russian Federation, Nizhny Novgorod, 603950
V. Yu. Chalkov
Physical Technical Research Institute
Email: matveevsa.sou@gmail.com
Russian Federation, Nizhny Novgorod, 603950
S. A. Denisov
Physical Technical Research Institute
Email: matveevsa.sou@gmail.com
Russian Federation, Nizhny Novgorod, 603950
S. A. Matveev
Nizhny Novgorod State University
Author for correspondence.
Email: matveevsa.sou@gmail.com
Russian Federation, Nizhny Novgorod, 603950
A. V. Nezhdanov
Nizhny Novgorod State University
Email: matveevsa.sou@gmail.com
Russian Federation, Nizhny Novgorod, 603950
A. I. Mashin
Nizhny Novgorod State University
Email: matveevsa.sou@gmail.com
Russian Federation, Nizhny Novgorod, 603950
D. O. Filatov
Physical Technical Research Institute
Email: matveevsa.sou@gmail.com
Russian Federation, Nizhny Novgorod, 603950
M. V. Stepikhova
Nizhny Novgorod State University; Institute for Physics of Microstructures
Email: matveevsa.sou@gmail.com
Russian Federation, Nizhny Novgorod, 603950; Nizhny Novgorod oblast, 607680
Z. F. Krasilnik
Nizhny Novgorod State University; Institute for Physics of Microstructures
Email: matveevsa.sou@gmail.com
Russian Federation, Nizhny Novgorod, 603950; Nizhny Novgorod oblast, 607680