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Pulsed magnetron sputtering and ion-induced annealing of carbon films
Shevchenko E.F., Sysoev I.A., Prucnal S., Frenzel K.
Features of the electrical conductivity of Fe, Ni, Ti, and Pt nanoisland films: Hysteresis and ion-field processes
Tomilin S.V., Berzhansky V.N., Yanovsky A.S., Tomilina O.A.
Modification of YBa2Cu3O7–δ thin films by ion implantation
Vasiliev V.K., Korolev D.S., Korolev S.A., Masterov D.V., Mikhaylov A.N., Okhapkin A.I., Pavlov S.A., Parafin A.E., Yunin P.A., Skorokhodov E.V., Tetelbaum D.I.
Formation of Oxide Layers on the Surface of Copper and its Alloys Modified by a High-Power Ion Beam
Panova T.V., Kovivchak V.S.
A Comment on the Computer Simulation Program SRIM
Shulga V.I.
Description of the Charge–Energy Distribution of Fast Ions
Novikov N.V., Teplova Y.A.
Features of Ion-Beam Polishing of the Surface of Sapphire
Lunin L.S., Sinel’nikov B.M., Sysoev I.A.
Hydrogen-Permeability of Titanium-Nitride (TiN) Coatings Obtained via the Plasma-Immersion Ion Implantation of Titanium and TiN Vacuum-Arc Deposition on Zr−1%Nb Alloy
Zhang L., Nikitenkov N.N., Sutygina A.N., Kashkarov E.B., Sypchenko V.S., Babihina M.N.
Ion-Beam Synthesis of Ferromagnetic Films by the Implantation of Co+ Ions into Silicon
Chirkov V.V., Gumarov G.G., Petukhov V.Y., Denisov A.E.
Emission theory of amorphous-material sputtering. Energy dependence of the sputtering coefficient
Pustovit A.N.
Modeling of the glow discharge cathode sheath and the cathode surface sputtering in a mixture of argon with mercury vapor
Dubinina M.S., Savichkin D.O., Fisher M.R., Kristya V.I.
Formation of thin oxide layer on surface of copper caused by implantation of high-energy oxygen ions
Khaydukov Y.N., Soltwedel O., Marchenko Y.A., Khaidukova D.Y., Csik A., Acartürk T., Starke U., Keller T., Guglya A.G., Kazdayev K.R.
Fragmentation cross section of 800 A · MeV silicon ions on polyethylene target
Li J., Zhang D.H., Ao H.H., Tian M.M., Feng Z., Sun Y.Q., Kodaira S., Yasuda N.
Chemical composition and atomic structure of the surface of copper–manganese alloy modified with oxygen ions
Surnin D.V., Vorob’ev V.L., Gilmutdinov F.Z., Mukhgalin V.V., Bakieva O.R., Kolotov A.A., Vetoshkin V.M.
Calculation of Ion Reflection from Solids: Computer Simulation and Theory
Tolmachev A.I., Forlano L.
Studying the Emission of X-Ray Quanta, Neutrons, and Charged Particles from Deuterated Structures Irradiated with X-Rays
Dalkarov O.D., Negodaev M.A., Rusetskii A.S., Tsechosh V.I., Lyakhov B.F., Saunin E.I., Bolotokov A.A., Kudryashov I.A.
Simulation of Redeposited Silicon Sputtering under Focused Ion Beam Irradiation
Borgardt N.I., Volkov R.L., Rumyantsev A.V.
Profile, morphology and surface elemental composition of through micro-holes in silicon wafers
Zhukov A.A., Zabotin Y.M., Podgorodetsky S.G., Anurov A.E.
Space‒time inhomogeneity of the electron flow in pyroelectric X-ray sources
Andrianov V.A., Bush A.A., Erzinkyan A.L., Kamentsev K.E.
Study of the formation and unimolecular fragmentation of SinOm+ clusters under ion bombardment
Dzhemilev N.K., Kovalenko S.F., Maksimov S.E., Tukfatullin O.F., Khozhiev S.T.
Projectile fragment emission in the fragmentation of silicon on carbon and polyethylene targets at 775 A · MeV
Zhang D., Li J., Kodaira S., Yasuda N.
On the influence of a high-power ion beam on thin polymer layers deposited onto dielectric substrates
Kovivchak V.S., Kryazhev Y.G., Zapevalova E.S., Likholobov V.A.
Fabrication of Nanostructured Carbon on the Surface of Commercial Polymers Using a High-Energy Ion Beam
Kovivchak V.S., Kryazhev Y.G.
Composition and Structure of a Nanofilm Multilayer System of the SiO2/Si/CoSi2/Si(111) Type Obtained via Ion Implantation
Ergashov Y.S., Umirzakov B.E.
Influence of Plasma-Immersion Titanium-Ion Implantation on the Kinetics of Hydrogen Penetration into E110 Zirconium Alloy
Kashkarov E.B., Nikitenkov N.N., Sutygina A.N., Syrtanov M.S., Zakharchenko S.A., Obrosov A.
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