Study of the formation and unimolecular fragmentation of Si  n  O  m   +  clusters under ion bombardment

N. Kh. Dzhemilev; S. F. Kovalenko; S. E. Maksimov; O. F. Tukfatullin; Sh. T. Khozhiev

doi:10.1134/S1027451017010074

Study of the formation and unimolecular fragmentation of Si_nO_m⁺ clusters under ion bombardment

作者: Dzhemilev N.K.¹, Kovalenko S.F.¹, Maksimov S.E.¹, Tukfatullin O.F.¹, Khozhiev S.T.¹
隶属关系:
1. Institute of Ion-Plasma and Laser Technologies
期: 卷 11, 编号 3 (2017)
页面: 490-495
栏目: Article
URL: https://journals.rcsi.science/1027-4510/article/view/192927
DOI: https://doi.org/10.1134/S1027451017010074
ID: 192927

如何引用文章

全文:

开放存取

##reader.subscriptionAccessGranted##
受限制的访问

订阅存取

详细
作者简介
参考
补充文件
统计

详细

The dependences of the emission and fragmentation of clusters sputtered by Xe⁺ ions from the surface of Si_nO_m⁺ on the oxygen pressure near the bombarded surface are studied using secondary ion mass spectrometry. It is shown that the process of Si_nO_m⁺ cluster formation under ion bombardment can be described within the framework of the mechanism of combinatorial synthesis by taking into account the mutual reversibility of the reactions of formation and unimolecular decay.