Indium nanowires at the silicon surface
- 作者: Kozhukhov A.S.1, Sheglov D.V.1, Latyshev A.V.1
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隶属关系:
- Institute of Semiconductor Physics, Siberian Branch
- 期: 卷 50, 编号 7 (2016)
- 页面: 901-903
- 栏目: Surfaces, Interfaces, and Thin Films
- URL: https://journals.rcsi.science/1063-7826/article/view/197393
- DOI: https://doi.org/10.1134/S1063782616070095
- ID: 197393
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详细
Conductive indium nanowires up to 50 nm in width and up to 10 μm in length are fabricated on the surface of silicon by local resputtering from the probe of an atomic-force microscope. The transfer of indium from the probe of the atomic-force microscope onto the silicon surface is initiated by applying a potential between the probe and the surface as they approach each other to spacings, at which the mutual repulsive force is ~10–7 N. The conductivity of the nanowires ranges from 7 × 10–3 to 4 × 10–2 Ω cm, which is several orders of magnitude lower than that in the case of the alternative technique of heat transfer.
作者简介
A. Kozhukhov
Institute of Semiconductor Physics, Siberian Branch
编辑信件的主要联系方式.
Email: antonkozhukhov@yandex.ru
俄罗斯联邦, Novosibirsk, 630090
D. Sheglov
Institute of Semiconductor Physics, Siberian Branch
Email: antonkozhukhov@yandex.ru
俄罗斯联邦, Novosibirsk, 630090
A. Latyshev
Institute of Semiconductor Physics, Siberian Branch
Email: antonkozhukhov@yandex.ru
俄罗斯联邦, Novosibirsk, 630090
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