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Influence of the Surface Layer on the Electrochemical Deposition of Metals and Semiconductors into Mesoporous Silicon
Chubenko E.B., Redko S.V., Sherstnyov A.I., Petrovich V.A., Kotov D.A., Bondarenko V.P.
Nanostructured ITO/SiO2 Coatings
Markov L.K., Pavluchenko A.S., Smirnova I.P.
Diffusion and Interaction of In and As Implanted into SiO2 Films
Tyschenko I.E., Voelskow M., Mikhaylov A.N., Tetelbaum D.I.
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