Experimental Evaluation of Reliability of Deep Submicron SOI MOS Transistors at High Temperatures


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Abstract

In this paper, 0.18–0.5 μm SOI MOS transistors are tested for compliance with the reliability criteria applied to high-temperature electronics and their components. The main parameters of SOI MOS transistors are measured in the temperature range from −60 to +300°С. The specific behavior exhibited by SOI MOS transistors at high temperatures should be taken into account when designing high-temperature integrated circuits so as to avoid premature failures and increase the reliability of devices.

About the authors

A. S. Benediktov

Molecular Electronics Research Institute (MERI)

Author for correspondence.
Email: asb_sm@mail.ru
Russian Federation, Zelenograd, Moscow, 124460

N. A. Shelepin

Molecular Electronics Research Institute (MERI)

Email: asb_sm@mail.ru
Russian Federation, Zelenograd, Moscow, 124460

P. V. Ignatov

Molecular Electronics Research Institute (MERI)

Email: asb_sm@mail.ru
Russian Federation, Zelenograd, Moscow, 124460


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