Experimental Evaluation of Reliability of Deep Submicron SOI MOS Transistors at High Temperatures


Citar

Texto integral

Acesso aberto Acesso aberto
Acesso é fechado Acesso está concedido
Acesso é fechado Somente assinantes

Resumo

In this paper, 0.18–0.5 μm SOI MOS transistors are tested for compliance with the reliability criteria applied to high-temperature electronics and their components. The main parameters of SOI MOS transistors are measured in the temperature range from −60 to +300°С. The specific behavior exhibited by SOI MOS transistors at high temperatures should be taken into account when designing high-temperature integrated circuits so as to avoid premature failures and increase the reliability of devices.

Sobre autores

A. Benediktov

Molecular Electronics Research Institute (MERI)

Autor responsável pela correspondência
Email: asb_sm@mail.ru
Rússia, Zelenograd, Moscow, 124460

N. Shelepin

Molecular Electronics Research Institute (MERI)

Email: asb_sm@mail.ru
Rússia, Zelenograd, Moscow, 124460

P. Ignatov

Molecular Electronics Research Institute (MERI)

Email: asb_sm@mail.ru
Rússia, Zelenograd, Moscow, 124460

Arquivos suplementares

Arquivos suplementares
Ação
1. JATS XML

Declaração de direitos autorais © Pleiades Publishing, Ltd., 2018