Visualization of Defects on the Semiconductor Surface Using a Dielectric Barrier Discharge


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It is demonstrated that plasma techniques can be used to detect various defects on a solid surface by a self-sustained discharge under atmospheric pressure. Special attention is paid to controlling surface defects and the end cleavages of semiconducting wafers and pinholes of layered structures.

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D. Sitanov

Ivanovo State University of Chemistry and Technology

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Email: sitanov@isuct.ru
俄罗斯联邦, Ivanovo, 153000

S. Pivovarenok

Ivanovo State University of Chemistry and Technology

Email: sitanov@isuct.ru
俄罗斯联邦, Ivanovo, 153000

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