Visualization of Defects on the Semiconductor Surface Using a Dielectric Barrier Discharge
- 作者: Sitanov D.V.1, Pivovarenok S.A.1
-
隶属关系:
- Ivanovo State University of Chemistry and Technology
- 期: 卷 47, 编号 1 (2018)
- 页面: 34-39
- 栏目: Article
- URL: https://journals.rcsi.science/1063-7397/article/view/186776
- DOI: https://doi.org/10.1134/S1063739718010067
- ID: 186776
如何引用文章
详细
It is demonstrated that plasma techniques can be used to detect various defects on a solid surface by a self-sustained discharge under atmospheric pressure. Special attention is paid to controlling surface defects and the end cleavages of semiconducting wafers and pinholes of layered structures.
作者简介
D. Sitanov
Ivanovo State University of Chemistry and Technology
编辑信件的主要联系方式.
Email: sitanov@isuct.ru
俄罗斯联邦, Ivanovo, 153000
S. Pivovarenok
Ivanovo State University of Chemistry and Technology
Email: sitanov@isuct.ru
俄罗斯联邦, Ivanovo, 153000
补充文件
