Visualization of Defects on the Semiconductor Surface Using a Dielectric Barrier Discharge
- Autores: Sitanov D.V.1, Pivovarenok S.A.1
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Afiliações:
- Ivanovo State University of Chemistry and Technology
- Edição: Volume 47, Nº 1 (2018)
- Páginas: 34-39
- Seção: Article
- URL: https://journals.rcsi.science/1063-7397/article/view/186776
- DOI: https://doi.org/10.1134/S1063739718010067
- ID: 186776
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Resumo
It is demonstrated that plasma techniques can be used to detect various defects on a solid surface by a self-sustained discharge under atmospheric pressure. Special attention is paid to controlling surface defects and the end cleavages of semiconducting wafers and pinholes of layered structures.
Sobre autores
D. Sitanov
Ivanovo State University of Chemistry and Technology
Autor responsável pela correspondência
Email: sitanov@isuct.ru
Rússia, Ivanovo, 153000
S. Pivovarenok
Ivanovo State University of Chemistry and Technology
Email: sitanov@isuct.ru
Rússia, Ivanovo, 153000
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