Visualization of Defects on the Semiconductor Surface Using a Dielectric Barrier Discharge
- Авторы: Sitanov D.V.1, Pivovarenok S.A.1
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Учреждения:
- Ivanovo State University of Chemistry and Technology
- Выпуск: Том 47, № 1 (2018)
- Страницы: 34-39
- Раздел: Article
- URL: https://journals.rcsi.science/1063-7397/article/view/186776
- DOI: https://doi.org/10.1134/S1063739718010067
- ID: 186776
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Аннотация
It is demonstrated that plasma techniques can be used to detect various defects on a solid surface by a self-sustained discharge under atmospheric pressure. Special attention is paid to controlling surface defects and the end cleavages of semiconducting wafers and pinholes of layered structures.
Об авторах
D. Sitanov
Ivanovo State University of Chemistry and Technology
Автор, ответственный за переписку.
Email: sitanov@isuct.ru
Россия, Ivanovo, 153000
S. Pivovarenok
Ivanovo State University of Chemistry and Technology
Email: sitanov@isuct.ru
Россия, Ivanovo, 153000
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