Investigation of textured aluminum nitride films prepared by chemical vapor deposition

A. N. Red’kin; M. V. Ryzhova; E. E. Yakimov; D. V. Roshchupkin

doi:10.1134/S1063739717010085

Investigation of textured aluminum nitride films prepared by chemical vapor deposition

Authors: Red’kin A.N.¹, Ryzhova M.V.¹, Yakimov E.E.¹, Roshchupkin D.V.¹
Affiliations:
1. Institute of Microelectronics Technology and High-Purity Materials
Issue: Vol 46, No 1 (2017)
Pages: 26-29
Section: Article
URL: https://journals.rcsi.science/1063-7397/article/view/186204
DOI: https://doi.org/10.1134/S1063739717010085
ID: 186204

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Abstract

Textured polycrystalline aluminum nitride films are grown on a silica substrate by chemical vapor deposition using metallic aluminum and ammonium chloride as the initial reagents. The good texture and crystal quality of the prepared films are confirmed by raster electron microscopy, Raman spectroscopy, and X-ray diffraction.