Investigation of textured aluminum nitride films prepared by chemical vapor deposition

A. N. Red’kin; M. V. Ryzhova; E. E. Yakimov; D. V. Roshchupkin

doi:10.1134/S1063739717010085

Investigation of textured aluminum nitride films prepared by chemical vapor deposition

作者: Red’kin A.N.¹, Ryzhova M.V.¹, Yakimov E.E.¹, Roshchupkin D.V.¹
隶属关系:
1. Institute of Microelectronics Technology and High-Purity Materials
期: 卷 46, 编号 1 (2017)
页面: 26-29
栏目: Article
URL: https://journals.rcsi.science/1063-7397/article/view/186204
DOI: https://doi.org/10.1134/S1063739717010085
ID: 186204

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详细

Textured polycrystalline aluminum nitride films are grown on a silica substrate by chemical vapor deposition using metallic aluminum and ammonium chloride as the initial reagents. The good texture and crystal quality of the prepared films are confirmed by raster electron microscopy, Raman spectroscopy, and X-ray diffraction.