Мақаланы E-mail арқылы жіберу On the influence of various oxygen-containing gases on composition of trifluoromethane plasma
- Авторлар: Efremov A.M.1,2, Koryakova E.E.1, Betelin V.B.2, Kwon K.H.3
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Мекемелер:
- Molecular Electronics Research Institute
- Scientific Research Institute for System Analysis of the National Research Centre “Kurchatov Institute”
- Korea University
- Шығарылым: Том 54, № 5 (2025)
- Беттер: 438-446
- Бөлім: ТЕХНОЛОГИИ
- URL: https://journals.rcsi.science/0544-1269/article/view/353911
- DOI: https://doi.org/10.7868/S3034548025050073
- ID: 353911
Дәйексөз келтіру
Ашық рұқсат
Рұқсат берілді
Тек жазылушылар үшін
Аннотация
The model-based study of plasma composition in respect to neutral species in CHF 3 + O 2 , CHF 3 + СO и CHF 3 + СO 2 mixtures under the condition of inductive 13.56 MHz discharge at constant gas pressure (6 mTorr) and input power (700 W) was carried out. It was found that effects produced by additions of CO and CO 2 are sufficiently different compared with a “classical” case of CHF 3 + O 2 plasma, where an increase of plasma chemical activity as well as a rapid decrease in polymerization ability take place. The reasonability of obtained data was confirmed by the satisfactory agreement between model-predicted densities of fluorine atoms and their counterparts measured by optical emission actinometry.
Негізгі сөздер
Авторлар туралы
A. Efremov
Molecular Electronics Research Institute; Scientific Research Institute for System Analysis of the National Research Centre “Kurchatov Institute”
Email: amefremov@mail.ru
Zelenorgad, Moscow, Russia; Moscow, Russia
E. Koryakova
Molecular Electronics Research InstituteZelenorgad, Moscow, Russia
V. Betelin
Scientific Research Institute for System Analysis of the National Research Centre “Kurchatov Institute”Moscow, Russia
K. Kwon
Korea UniversityChochiwon, Korea
Әдебиет тізімі
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