Electronic structure and features of interatomic interactions in methoxysilanes HnSi(OCH3)4–n
- Авторы: Tatevosyan M.1, Danilenko T.1, Vlasenko V.1
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Учреждения:
- Research Institute of Physics
- Выпуск: Том 86, № 9 (2016)
- Страницы: 2008-2015
- Раздел: Article
- URL: https://journals.rcsi.science/1070-3632/article/view/216106
- DOI: https://doi.org/10.1134/S107036321609005X
- ID: 216106
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Аннотация
The electronic structure and features of interatomic interactions in a series of methoxysilanes HnSi(OCH3)4–n (n = 3–0) were studied via density functional theory-based computer simulation and comparison of the simulated results with the photoelectron spectroscopic data. Calculations for the Si(OH)4, SiH4, H2O, and CH4 molecules were also performed in order to establish the laws governing the electronic structure formation of methoxysilanes. The distributions of the densities of electron states in the valence band and the correlation energy diagrams, supplemented by visualization of the molecular orbitals of the compounds, were constructed.
Об авторах
M. Tatevosyan
Research Institute of Physics
Автор, ответственный за переписку.
Email: mmtat@yandex.ru
Россия, pr. Stachki 194, Rostov-on-Don, 344090
T. Danilenko
Research Institute of Physics
Email: mmtat@yandex.ru
Россия, pr. Stachki 194, Rostov-on-Don, 344090
V. Vlasenko
Research Institute of Physics
Email: mmtat@yandex.ru
Россия, pr. Stachki 194, Rostov-on-Don, 344090