Electronic structure and features of interatomic interactions in methoxysilanes HnSi(OCH3)4–n


如何引用文章

全文:

开放存取 开放存取
受限制的访问 ##reader.subscriptionAccessGranted##
受限制的访问 订阅存取

详细

The electronic structure and features of interatomic interactions in a series of methoxysilanes HnSi(OCH3)4–n (n = 3–0) were studied via density functional theory-based computer simulation and comparison of the simulated results with the photoelectron spectroscopic data. Calculations for the Si(OH)4, SiH4, H2O, and CH4 molecules were also performed in order to establish the laws governing the electronic structure formation of methoxysilanes. The distributions of the densities of electron states in the valence band and the correlation energy diagrams, supplemented by visualization of the molecular orbitals of the compounds, were constructed.

作者简介

M. Tatevosyan

Research Institute of Physics

编辑信件的主要联系方式.
Email: mmtat@yandex.ru
俄罗斯联邦, pr. Stachki 194, Rostov-on-Don, 344090

T. Danilenko

Research Institute of Physics

Email: mmtat@yandex.ru
俄罗斯联邦, pr. Stachki 194, Rostov-on-Don, 344090

V. Vlasenko

Research Institute of Physics

Email: mmtat@yandex.ru
俄罗斯联邦, pr. Stachki 194, Rostov-on-Don, 344090


版权所有 © Pleiades Publishing, Ltd., 2016
##common.cookie##