Reliability Investigation of 0.18-μm SOI MOS Transistors at High Temperatures
- 作者: Benediktov A.S.1, Ignatov P.V.1, Mikhailov A.A.1, Potupchik A.G.1
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隶属关系:
- Molecular Electronics Research Institute (MERI)
- 期: 卷 47, 编号 5 (2018)
- 页面: 317-322
- 栏目: Article
- URL: https://journals.rcsi.science/1063-7397/article/view/186885
- DOI: https://doi.org/10.1134/S1063739718050037
- ID: 186885
如何引用文章
详细
In this paper, we estimate the basic parameters of 0.18-μm SOI MOS transistors in the temperature range from –60 to 300°С and investigate their reliability at high temperatures. The specific characteristics of SOI MOS transistors that manifest themselves at high temperatures should be taken into account when designing high-temperature integrated circuits in order to avoid their premature failures and improve the reliability of electronic devices.
作者简介
A. Benediktov
Molecular Electronics Research Institute (MERI)
编辑信件的主要联系方式.
Email: asb_sm@mail.ru
俄罗斯联邦, Zelenograd, Moscow, 124460
P. Ignatov
Molecular Electronics Research Institute (MERI)
Email: asb_sm@mail.ru
俄罗斯联邦, Zelenograd, Moscow, 124460
A. Mikhailov
Molecular Electronics Research Institute (MERI)
Email: asb_sm@mail.ru
俄罗斯联邦, Zelenograd, Moscow, 124460
A. Potupchik
Molecular Electronics Research Institute (MERI)
Email: asb_sm@mail.ru
俄罗斯联邦, Zelenograd, Moscow, 124460
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