Reliability Investigation of 0.18-μm SOI MOS Transistors at High Temperatures


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In this paper, we estimate the basic parameters of 0.18-μm SOI MOS transistors in the temperature range from –60 to 300°С and investigate their reliability at high temperatures. The specific characteristics of SOI MOS transistors that manifest themselves at high temperatures should be taken into account when designing high-temperature integrated circuits in order to avoid their premature failures and improve the reliability of electronic devices.

作者简介

A. Benediktov

Molecular Electronics Research Institute (MERI)

编辑信件的主要联系方式.
Email: asb_sm@mail.ru
俄罗斯联邦, Zelenograd, Moscow, 124460

P. Ignatov

Molecular Electronics Research Institute (MERI)

Email: asb_sm@mail.ru
俄罗斯联邦, Zelenograd, Moscow, 124460

A. Mikhailov

Molecular Electronics Research Institute (MERI)

Email: asb_sm@mail.ru
俄罗斯联邦, Zelenograd, Moscow, 124460

A. Potupchik

Molecular Electronics Research Institute (MERI)

Email: asb_sm@mail.ru
俄罗斯联邦, Zelenograd, Moscow, 124460

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