Reliability Investigation of 0.18-μm SOI MOS Transistors at High Temperatures
- Авторлар: Benediktov A.S.1, Ignatov P.V.1, Mikhailov A.A.1, Potupchik A.G.1
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Мекемелер:
- Molecular Electronics Research Institute (MERI)
- Шығарылым: Том 47, № 5 (2018)
- Беттер: 317-322
- Бөлім: Article
- URL: https://journals.rcsi.science/1063-7397/article/view/186885
- DOI: https://doi.org/10.1134/S1063739718050037
- ID: 186885
Дәйексөз келтіру
Аннотация
In this paper, we estimate the basic parameters of 0.18-μm SOI MOS transistors in the temperature range from –60 to 300°С and investigate their reliability at high temperatures. The specific characteristics of SOI MOS transistors that manifest themselves at high temperatures should be taken into account when designing high-temperature integrated circuits in order to avoid their premature failures and improve the reliability of electronic devices.
Авторлар туралы
A. Benediktov
Molecular Electronics Research Institute (MERI)
Хат алмасуға жауапты Автор.
Email: asb_sm@mail.ru
Ресей, Zelenograd, Moscow, 124460
P. Ignatov
Molecular Electronics Research Institute (MERI)
Email: asb_sm@mail.ru
Ресей, Zelenograd, Moscow, 124460
A. Mikhailov
Molecular Electronics Research Institute (MERI)
Email: asb_sm@mail.ru
Ресей, Zelenograd, Moscow, 124460
A. Potupchik
Molecular Electronics Research Institute (MERI)
Email: asb_sm@mail.ru
Ресей, Zelenograd, Moscow, 124460
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