Investigation of the properties and manufacturing features of nonvolatile FRAM memory based on atomic layer deposition
- 作者: Orlov O.1,2, Markeev A.3, Zenkevich A.3, Chernikova A.3, Spiridonov M.3, Izmaylov R.3,2, Gornev E.1,2
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隶属关系:
- JSC Mikron
- SC Molecular Electronics Research Institute
- Moscow Institute of Physics and Technology
- 期: 卷 45, 编号 4 (2016)
- 页面: 262-269
- 栏目: Article
- URL: https://journals.rcsi.science/1063-7397/article/view/185689
- DOI: https://doi.org/10.1134/S1063739716040077
- ID: 185689
如何引用文章
详细
The structural and electrical properties of materials based on hafnium oxide grown by atomic layer deposition (ALD) are analyzed. The possibility and prospects of the use of their nanoscale films in nonvolatile memory are considered. The possibility of scaling Ferroelectric random access memory (FRAM) to subμm dimensions while preserving the ferroelectric properties is shown.
作者简介
O. Orlov
JSC Mikron; SC Molecular Electronics Research Institute
编辑信件的主要联系方式.
Email: oorlov@mikron.ru
俄罗斯联邦, Zelenograd; Zelenograd
A. Markeev
Moscow Institute of Physics and Technology
Email: oorlov@mikron.ru
俄罗斯联邦, Moscow
A. Zenkevich
Moscow Institute of Physics and Technology
Email: oorlov@mikron.ru
俄罗斯联邦, Moscow
A. Chernikova
Moscow Institute of Physics and Technology
Email: oorlov@mikron.ru
俄罗斯联邦, Moscow
M. Spiridonov
Moscow Institute of Physics and Technology
Email: oorlov@mikron.ru
俄罗斯联邦, Moscow
R. Izmaylov
Moscow Institute of Physics and Technology; SC Molecular Electronics Research Institute
Email: oorlov@mikron.ru
俄罗斯联邦, Moscow; Zelenograd
E. Gornev
JSC Mikron; SC Molecular Electronics Research Institute
Email: oorlov@mikron.ru
俄罗斯联邦, Zelenograd; Zelenograd