Physicochemical deposition features of peritectic alloys for high-density chipping of silicon crystals
- Авторы: Roshchin V.1, Dshkhunyan V.2, Petukhov I.1, Sen’chenko K.1, Vagin M.1
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Учреждения:
- National Research University MIET
- OAO Rossiiskaya Elektronika
- Выпуск: Том 45, № 5 (2016)
- Страницы: 324-328
- Раздел: Article
- URL: https://journals.rcsi.science/1063-7397/article/view/185735
- DOI: https://doi.org/10.1134/S1063739716040090
- ID: 185735
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Аннотация
Physicochemical aspects of the electrochemical formation of vertical contact structures of the Sn–Ag peritectic composition for chipping integrated microcircuits by the inverted crystal method are considered. The layer-by-layer deposition of metals is investigated and the conditions of the vertical growth of the structures are determined.
Об авторах
V. Roshchin
National Research University MIET
Автор, ответственный за переписку.
Email: OFH.MIET@yandex.ru
Россия, Moscow
V. Dshkhunyan
OAO Rossiiskaya Elektronika
Email: OFH.MIET@yandex.ru
Россия, Moscow
I. Petukhov
National Research University MIET
Email: OFH.MIET@yandex.ru
Россия, Moscow
K. Sen’chenko
National Research University MIET
Email: OFH.MIET@yandex.ru
Россия, Moscow
M. Vagin
National Research University MIET
Email: OFH.MIET@yandex.ru
Россия, Moscow