Отправить статью по E-mail Masking Properties of Structures Based on a Triacrylamide Derivative of Polyfluorochalcone at Wet and Reactive Ion Etching
- Авторы: Derevyashkin S.1,2, Soboleva E.1, Shelkovnikov V.1,3, Malyshev A.4, Korolkov V.4
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Учреждения:
- Novosibirsk Institute of Organic Chemistry, Siberian Branch, Russian Academy of Sciences,
- Institute of Laser Physics, Siberian Branch, Russian Academy of Sciences
- Novosibirsk State Technical University
- Institute of Automation and Electrometry, Siberian Branch, Russian Academy of Sciences
- Выпуск: Том 48, № 1 (2019)
- Страницы: 13-27
- Раздел: Article
- URL: https://journals.rcsi.science/1063-7397/article/view/187076
- DOI: https://doi.org/10.1134/S1063739719010037
- ID: 187076
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Аннотация
The masking properties are studied for polymeric structures based on a triacrylamide derivative of polyfluorochalcone at wet etching in aqueous acidic (H2SO4, H3PO4) and alkaline (NaOH) environments, as well as at reactive ion etching (CF4). The kinetic curves are obtained and the etching rates inherent in the photoresists are estimated. A comparison with commercially available photoresists AZ4562 and SU-8 is performed.
Об авторах
S. Derevyashkin
Novosibirsk Institute of Organic Chemistry, Siberian Branch, Russian Academy of Sciences,; Institute of Laser Physics, Siberian Branch, Russian Academy of Sciences
Автор, ответственный за переписку.
Email: Lilpick69@mail.ru
Россия, Novosibirsk, 630090; Novosibirsk, 630090
E. Soboleva
Novosibirsk Institute of Organic Chemistry, Siberian Branch, Russian Academy of Sciences,
Email: Lilpick69@mail.ru
Россия, Novosibirsk, 630090
V. Shelkovnikov
Novosibirsk Institute of Organic Chemistry, Siberian Branch, Russian Academy of Sciences,; Novosibirsk State Technical University
Email: Lilpick69@mail.ru
Россия, Novosibirsk, 630090; Novosibirsk, 630073
A. Malyshev
Institute of Automation and Electrometry, Siberian Branch, Russian Academy of Sciences
Email: Lilpick69@mail.ru
Россия, Novosibirsk, 630090
V. Korolkov
Institute of Automation and Electrometry, Siberian Branch, Russian Academy of Sciences
Email: Lilpick69@mail.ru
Россия, Novosibirsk, 630090
