Enviar artigo por via de e-mail Masking Properties of Structures Based on a Triacrylamide Derivative of Polyfluorochalcone at Wet and Reactive Ion Etching
- Autores: Derevyashkin S.1,2, Soboleva E.1, Shelkovnikov V.1,3, Malyshev A.4, Korolkov V.4
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Afiliações:
- Novosibirsk Institute of Organic Chemistry, Siberian Branch, Russian Academy of Sciences,
- Institute of Laser Physics, Siberian Branch, Russian Academy of Sciences
- Novosibirsk State Technical University
- Institute of Automation and Electrometry, Siberian Branch, Russian Academy of Sciences
- Edição: Volume 48, Nº 1 (2019)
- Páginas: 13-27
- Seção: Article
- URL: https://journals.rcsi.science/1063-7397/article/view/187076
- DOI: https://doi.org/10.1134/S1063739719010037
- ID: 187076
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Resumo
The masking properties are studied for polymeric structures based on a triacrylamide derivative of polyfluorochalcone at wet etching in aqueous acidic (H2SO4, H3PO4) and alkaline (NaOH) environments, as well as at reactive ion etching (CF4). The kinetic curves are obtained and the etching rates inherent in the photoresists are estimated. A comparison with commercially available photoresists AZ4562 and SU-8 is performed.
Sobre autores
S. Derevyashkin
Novosibirsk Institute of Organic Chemistry, Siberian Branch, Russian Academy of Sciences,; Institute of Laser Physics, Siberian Branch, Russian Academy of Sciences
Autor responsável pela correspondência
Email: Lilpick69@mail.ru
Rússia, Novosibirsk, 630090; Novosibirsk, 630090
E. Soboleva
Novosibirsk Institute of Organic Chemistry, Siberian Branch, Russian Academy of Sciences,
Email: Lilpick69@mail.ru
Rússia, Novosibirsk, 630090
V. Shelkovnikov
Novosibirsk Institute of Organic Chemistry, Siberian Branch, Russian Academy of Sciences,; Novosibirsk State Technical University
Email: Lilpick69@mail.ru
Rússia, Novosibirsk, 630090; Novosibirsk, 630073
A. Malyshev
Institute of Automation and Electrometry, Siberian Branch, Russian Academy of Sciences
Email: Lilpick69@mail.ru
Rússia, Novosibirsk, 630090
V. Korolkov
Institute of Automation and Electrometry, Siberian Branch, Russian Academy of Sciences
Email: Lilpick69@mail.ru
Rússia, Novosibirsk, 630090
