The Influence of Small F2, H2, and HF Additives on the Concentration of Active Particles in Tetrafluoromethane Plasma
- 作者: Efremov A.1,2, Smirnov S.1,2, Betelin V.2
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隶属关系:
- Ivanovo State University of Chemistry and Technology
- Federal State Institution “Federal Scientific Center Research Institute for System Research,” Russian Academy of Sciences
- 期: 卷 52, 编号 5 (2023)
- 页面: 383-389
- 栏目: ПЛАЗМЕННЫЕ ТЕХНОЛОГИИ
- URL: https://journals.rcsi.science/0544-1269/article/view/138565
- DOI: https://doi.org/10.31857/S0544126923700540
- EDN: https://elibrary.ru/QCCCRC
- ID: 138565
如何引用文章
详细
A comparative study of the effect of small (up to 20%) substituting additives F2, H2, and HF on the kinetics and stationary concentrations of neutral particles in 50% CF4 + 50% Ar plasma under the typical conditions of reactive ion etching (RIE) of silicon and its compounds is carried out. It is shown that the vari-ation of the CF4/F2 and CF4/H2 ratios leads to opposite, interrelated, and nonadditive changes in the con-centrations of fluorine atoms and fluorocarbon radicals. This provides wide ranges of regulation of the etch-ing rate and polymerization capacity with the minimal disturbance of the parameters of the electronic and ionic components of the plasma. In contrast, the CF4/HF relation has the minimal effect on the rate of sur-face polymerization, but noticeably changes the concentration of fluorine atoms. Thus, there is a selective effect on the rate of the heterogeneous chemical reaction.
作者简介
A. Efremov
Ivanovo State University of Chemistry and Technology; Federal State Institution “Federal Scientific Center Research Institute for System Research,” Russian Academy of Sciences
Email: amefremov@mail.ru
Ivanovo, 153000 Russia; Moscow, Russia
S. Smirnov
Ivanovo State University of Chemistry and Technology; Federal State Institution “Federal Scientific Center Research Institute for System Research,” Russian Academy of Sciences
Email: amefremov@mail.ru
Ivanovo, 153000 Russia; Moscow, Russia
V. Betelin
Federal State Institution “Federal Scientific Center Research Institute for System Research,” Russian Academy of Sciences
编辑信件的主要联系方式.
Email: amefremov@mail.ru
Moscow, Russia
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