Structure of thin titanium nitride films deposited by magnetron sputtering

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Abstract

This review paper is focused on the structure of thin titanium nitride films formed by magnetron sputtering. A model of film growth depending on the deposition temperature and nitrogen flow is considered. This model is compared with experimental results. The effect of annealing on the structure of titanium nitride films is described.

About the authors

A. G. Isaev

NRC “Kurchatov Institute”

Email: isaev.ag@phystech.edu
Moscow, Russia

A. E. Rogozhin

NRC “Kurchatov Institute”

Author for correspondence.
Email: isaev.ag@phystech.edu
Moscow, Russia

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