Composition and structure of copper oxide films synthesized by reactive magnetron sputtering with a hot target

A. E. Lapshin; V. S. Levitskii; V. I. Shapovalov; A. E. Komlev; E. S. Shutova; I. L. Myl’nikov; A. A. Komlev

doi:10.1134/S108765961604009X

Composition and structure of copper oxide films synthesized by reactive magnetron sputtering with a hot target

Autores: Lapshin A.¹, Levitskii V.², Shapovalov V.², Komlev A.², Shutova E.², Myl’nikov I.², Komlev A.²
Afiliações:
1. Grebenshchikov Institute of Silicate Chemistry
2. St. Petersburg Electrotechnical University LETI
Edição: Volume 42, Nº 4 (2016)
Páginas: 359-362
Seção: Article
URL: https://journals.rcsi.science/1087-6596/article/view/215620
DOI: https://doi.org/10.1134/S108765961604009X
ID: 215620

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The influence of the target operation mode on the chemical composition and crystalline structure of copper oxide films deposited onto a quartz glass substrate has been studied using Raman spectroscopy and X-ray phase analysis. The films have been synthesized in an Ar + O₂ gaseous environment using two identical magnetrons, differing only by the method of target cooling.