Composition and structure of copper oxide films synthesized by reactive magnetron sputtering with a hot target

A. E. Lapshin; V. S. Levitskii; V. I. Shapovalov; A. E. Komlev; E. S. Shutova; I. L. Myl’nikov; A. A. Komlev

doi:10.1134/S108765961604009X

Composition and structure of copper oxide films synthesized by reactive magnetron sputtering with a hot target

Авторы: Lapshin A.¹, Levitskii V.², Shapovalov V.², Komlev A.², Shutova E.², Myl’nikov I.², Komlev A.²
Учреждения:
1. Grebenshchikov Institute of Silicate Chemistry
2. St. Petersburg Electrotechnical University LETI
Выпуск: Том 42, № 4 (2016)
Страницы: 359-362
Раздел: Article
URL: https://journals.rcsi.science/1087-6596/article/view/215620
DOI: https://doi.org/10.1134/S108765961604009X
ID: 215620

Цитировать

Полный текст

Открытый доступ
Доступ закрыт

Доступ предоставлен
Доступ закрыт

Только для подписчиков

Аннотация
Об авторах
Список литературы
Статистика

Аннотация

The influence of the target operation mode on the chemical composition and crystalline structure of copper oxide films deposited onto a quartz glass substrate has been studied using Raman spectroscopy and X-ray phase analysis. The films have been synthesized in an Ar + O₂ gaseous environment using two identical magnetrons, differing only by the method of target cooling.