Enviar artigo por via de e-mail Tribological behavior of TiN films depositid by reactive magnetron sputtering under low pressure
- Autores: Ermolenko M.V.1, Zavadski S.M.1, Golosov D.A.1, Melnikov S.N.1, Zamburg E.G.2
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Afiliações:
- Belarusian State University of Informatics and Radioelectronics
- Southern Federal University
- Edição: Volume 37, Nº 3 (2016)
- Páginas: 289-292
- Seção: Article
- URL: https://journals.rcsi.science/1068-3666/article/view/228312
- DOI: https://doi.org/10.3103/S1068366616030065
- ID: 228312
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Resumo
The effect of deposition conditions on the tribological behavior of titanium nitride thin films produced by reactive magnetron sputtering has been studied. Dependences of the hardness, the width of the friction track, the friction coefficient, and the volume wear of the TiN films on the N2 reactive gas flow rate have been obtained. Conditions of deposition under which the coatings with the best tribological characteristics are formed have been determined.
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Sobre autores
M. Ermolenko
Belarusian State University of Informatics and Radioelectronics
Email: szavad@mail.ru
Belarus, ul. P. Brovki 6, Minsk, 220013
S. Zavadski
Belarusian State University of Informatics and Radioelectronics
Autor responsável pela correspondência
Email: szavad@mail.ru
Belarus, ul. P. Brovki 6, Minsk, 220013
D. Golosov
Belarusian State University of Informatics and Radioelectronics
Email: szavad@mail.ru
Belarus, ul. P. Brovki 6, Minsk, 220013
S. Melnikov
Belarusian State University of Informatics and Radioelectronics
Email: szavad@mail.ru
Belarus, ul. P. Brovki 6, Minsk, 220013
E. Zamburg
Southern Federal University
Email: szavad@mail.ru
Rússia, ul. Shevchenko 2, Taganrog, 347928
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