Email this article Plasma technologies for material processing in nanoelectronics: Problems and solutions
- Authors: Shustin E.G.1,2
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Affiliations:
- Kotel’nikov Institute of Radio Engineering and Electronics (Fryazino Branch)
- Moscow Engineering Physics Institute (National Research Nuclear University)
- Issue: Vol 62, No 5 (2017)
- Pages: 454-465
- Section: Review
- URL: https://journals.rcsi.science/1064-2269/article/view/198285
- DOI: https://doi.org/10.1134/S106422691704012X
- ID: 198285
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Abstract
The review considers plasma-processing technologies used in solid-state electronics, both widely used and ones, which do not found yet industrial applications. Several from them are developed specifically for creating nanoelectronic devices. Tendencies toward an increase in the working rate and memory volume and a decrease in the sizes of telecommunication systems necessitate the development of electronic devices based on new principles and, hence, the corresponding technologies for implementation. Physical problems that impede the application of conventional methods in new problems are analyzed, and possible solutions are proposed.
About the authors
E. G. Shustin
Kotel’nikov Institute of Radio Engineering and Electronics (Fryazino Branch); Moscow Engineering Physics Institute (National Research Nuclear University)
Author for correspondence.
Email: shustin@ms.ire.rssi.ru
Russian Federation, Fryazino, Moscow oblast, 141190; Moscow, 115409
