Electrical properties of a TiN/TixAl1 – xOy/TiN memristor device manufactured by magnetron sputtering


Citar

Texto integral

Acesso aberto Acesso aberto
Acesso é fechado Acesso está concedido
Acesso é fechado Somente assinantes

Resumo

A memristor device with an active layer of mixed metal oxide has been manufactured using reactive magnetron sputtering and electron lithography. The device’s electrical characteristics, such as the switching voltage and resistances in the low-resistance (LRS) and high-resistance (HRS) states, are stable and they a high resistance ratio in these states. The electrical properties of the device, which are similar to those of a living synapse by neural pulse propagation, have been determined. The possibility of the memristor application as a summing element of an artificial neuron is shown. The large value of the high-to-low resistance ratio and minor variation of the electrical characteristics make it possible to use the device in the neuromorphic computing systems.

Sobre autores

A. Bobylev

Tyumen State University

Autor responsável pela correspondência
Email: andreaubobylev@gmail.com
Rússia, ul. Volodarskogo 6, Tyumen, 625003

S. Udovichenko

Tyumen State University

Email: andreaubobylev@gmail.com
Rússia, ul. Volodarskogo 6, Tyumen, 625003

Arquivos suplementares

Arquivos suplementares
Ação
1. JATS XML

Declaração de direitos autorais © Pleiades Publishing, Ltd., 2016