Multilayer graphene-based flash memory


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Resumo

For the memory element based on a Si/HfO2/multilayer graphene/SiO2/Si structure, the write/erase and charge storage characteristics are evaluated. A sufficiently large work function of electrons in multilayer graphene (MLG) makes it possible to increase the time of storing the charge injected into it. Using MLG in flash memory devices allows one to increase the speed and/or reduce the voltage of reprogramming such devices.

Sobre autores

Yu. Novikov

Rzhanov Institute of Semiconductor Physics, Siberian Branch

Autor responsável pela correspondência
Email: nov@isp.nsc.ru
Rússia, Moscow

V. Gritsenko

Rzhanov Institute of Semiconductor Physics, Siberian Branch; Novosibirsk State University, Novosibirsk

Email: nov@isp.nsc.ru
Rússia, Moscow; Moscow

G. Krasnikov

Scientific Research Institute of Molecular Electronics

Email: nov@isp.nsc.ru
Rússia, Moscow

O. Orlov

Scientific Research Institute of Molecular Electronics

Email: nov@isp.nsc.ru
Rússia, Moscow

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