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Power switching transistors based on gallium nitride epitaxial heterostructures


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Abstract

The results of the development of power switching transistors based on epitaxial gallium nitride heterostructures to create an energy-efficient conversion technique are presented. The developed powerful GaN transistor operates in enrichment mode with unlocking threshold voltage Vth = +1.2 V and a maximum drain-source current Ids = 0.15 A/mm at the drain-source voltage Vds = +8 V. The drain-source breakdown voltage in the closed state is Vb = 300 V at the drain-source distance Lds = 8.5 μm and drain-source voltage Vds = 0 V.

About the authors

E. V. Erofeev

Research Institute of Electrical Communication Systems

Author for correspondence.
Email: erofeev@micran.ru
Russian Federation, Tomsk, 634034

I. V. Fedin

Joint-Stock Research and Production Company Mikran

Email: erofeev@micran.ru
Russian Federation, Tomsk, 634045

Y. N. Yurjev

Physical Technical Institute

Email: erofeev@micran.ru
Russian Federation, Tomsk, 634050

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