Power switching transistors based on gallium nitride epitaxial heterostructures


Cite item

Full Text

Open Access Open Access
Restricted Access Access granted
Restricted Access Subscription Access

Abstract

The results of the development of power switching transistors based on epitaxial gallium nitride heterostructures to create an energy-efficient conversion technique are presented. The developed powerful GaN transistor operates in enrichment mode with unlocking threshold voltage Vth = +1.2 V and a maximum drain-source current Ids = 0.15 A/mm at the drain-source voltage Vds = +8 V. The drain-source breakdown voltage in the closed state is Vb = 300 V at the drain-source distance Lds = 8.5 μm and drain-source voltage Vds = 0 V.

About the authors

E. V. Erofeev

Research Institute of Electrical Communication Systems

Author for correspondence.
Email: erofeev@micran.ru
Russian Federation, Tomsk, 634034

I. V. Fedin

Joint-Stock Research and Production Company Mikran

Email: erofeev@micran.ru
Russian Federation, Tomsk, 634045

Y. N. Yurjev

Physical Technical Institute

Email: erofeev@micran.ru
Russian Federation, Tomsk, 634050


Copyright (c) 2017 Pleiades Publishing, Ltd.

This website uses cookies

You consent to our cookies if you continue to use our website.

About Cookies