Enviar artigo por via de e-mail Study into the properties of TiN/WN multilayer nanocoatings prepared via magnetron sputtering
- Autores: Bodnarchuk V.I.1, Petrov P.2, Kozlenko D.P.1, Dechev D.2, Ivanov N.2, Martev I.2, Kasatkin I.A.3
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Afiliações:
- Joint Institute for Nuclear Research
- Institute of Electronics
- St. Petersburg State University
- Edição: Volume 11, Nº 1 (2017)
- Páginas: 186-189
- Seção: Article
- URL: https://journals.rcsi.science/1027-4510/article/view/191541
- DOI: https://doi.org/10.1134/S1027451017010244
- ID: 191541
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Resumo
Titanium-nitride (TiN) and tungsten-nitride (WN) thin films with a layer thickness of 6 nm, which are obtained via magnetron sputtering on silicon substrates, are studied. The structural and mechanical properties are presented.
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Sobre autores
V. Bodnarchuk
Joint Institute for Nuclear Research
Autor responsável pela correspondência
Email: bodnarch@nf.jinr.ru
Rússia, Dubna, Moscow oblast, 141980
P. Petrov
Institute of Electronics
Email: bodnarch@nf.jinr.ru
Bulgária, Sofia, 1784
D. Kozlenko
Joint Institute for Nuclear Research
Email: bodnarch@nf.jinr.ru
Rússia, Dubna, Moscow oblast, 141980
D. Dechev
Institute of Electronics
Email: bodnarch@nf.jinr.ru
Bulgária, Sofia, 1784
N. Ivanov
Institute of Electronics
Email: bodnarch@nf.jinr.ru
Bulgária, Sofia, 1784
I. Martev
Institute of Electronics
Email: bodnarch@nf.jinr.ru
Bulgária, Sofia, 1784
I. Kasatkin
St. Petersburg State University
Email: bodnarch@nf.jinr.ru
Rússia, St. Petersburg, 199034
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