Study into the properties of TiN/WN multilayer nanocoatings prepared via magnetron sputtering


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详细

Titanium-nitride (TiN) and tungsten-nitride (WN) thin films with a layer thickness of 6 nm, which are obtained via magnetron sputtering on silicon substrates, are studied. The structural and mechanical properties are presented.

作者简介

V. Bodnarchuk

Joint Institute for Nuclear Research

编辑信件的主要联系方式.
Email: bodnarch@nf.jinr.ru
俄罗斯联邦, Dubna, Moscow oblast, 141980

P. Petrov

Institute of Electronics

Email: bodnarch@nf.jinr.ru
保加利亚, Sofia, 1784

D. Kozlenko

Joint Institute for Nuclear Research

Email: bodnarch@nf.jinr.ru
俄罗斯联邦, Dubna, Moscow oblast, 141980

D. Dechev

Institute of Electronics

Email: bodnarch@nf.jinr.ru
保加利亚, Sofia, 1784

N. Ivanov

Institute of Electronics

Email: bodnarch@nf.jinr.ru
保加利亚, Sofia, 1784

I. Martev

Institute of Electronics

Email: bodnarch@nf.jinr.ru
保加利亚, Sofia, 1784

I. Kasatkin

St. Petersburg State University

Email: bodnarch@nf.jinr.ru
俄罗斯联邦, St. Petersburg, 199034

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