Study into the properties of TiN/WN multilayer nanocoatings prepared via magnetron sputtering


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Abstract

Titanium-nitride (TiN) and tungsten-nitride (WN) thin films with a layer thickness of 6 nm, which are obtained via magnetron sputtering on silicon substrates, are studied. The structural and mechanical properties are presented.

About the authors

V. I. Bodnarchuk

Joint Institute for Nuclear Research

Author for correspondence.
Email: bodnarch@nf.jinr.ru
Russian Federation, Dubna, Moscow oblast, 141980

P. Petrov

Institute of Electronics

Email: bodnarch@nf.jinr.ru
Bulgaria, Sofia, 1784

D. P. Kozlenko

Joint Institute for Nuclear Research

Email: bodnarch@nf.jinr.ru
Russian Federation, Dubna, Moscow oblast, 141980

D. Dechev

Institute of Electronics

Email: bodnarch@nf.jinr.ru
Bulgaria, Sofia, 1784

N. Ivanov

Institute of Electronics

Email: bodnarch@nf.jinr.ru
Bulgaria, Sofia, 1784

I. Martev

Institute of Electronics

Email: bodnarch@nf.jinr.ru
Bulgaria, Sofia, 1784

I. A. Kasatkin

St. Petersburg State University

Email: bodnarch@nf.jinr.ru
Russian Federation, St. Petersburg, 199034

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