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Modeling of cathode sputtering in a low-current gas discharge in a mixture of argon with mercury vapor
Kristya V.I., Savichkin D.O., Fisher M.R.
On the Formation of Nanostructured Carbon Layers on the Surface of Organic Polymers under the Action of a High-Power Ion Beam
Kovivchak V.S.
Study of the Influence of Implanted Atoms on the Coefficients of the Sputtering of Silicon and Silicon with a Thin Oxide Film
Tashmukhamedova D.A., Yusupjanova M.B., Tashatov A.K., Umirzakov B.E.
Formation of the Equilibrium Charge Distribution of Fast Heavy Ions
Belkova Y.A., Novikov N.V., Teplova Y.A.
Influence of Zn+-Ion Implantation on the Process of Sapphire Charging by an Electron Beam
Tatarintsev A.A., Privezentsev V.V., Rau E.I., Goryachev A.V.
Nitriding of Stainless Steel in Electron-Beam Plasma in the Pulsed and DC Generation Modes
Gavrilov N.V., Mamaev A.S., Chukin A.V.
On the creation of ordered nuclei by ion bombardment for obtaining nanoscale si structures on the surface of CaF2 films
Umirzakov B.E., Donaev S.B.
Formation of the charge distribution of fast multicharged ions passing through a carbon target
Belkova Y.A., Novikov N.V., Teplova Y.A.
Pulsed magnetron sputtering and ion-induced annealing of carbon films
Shevchenko E.F., Sysoev I.A., Prucnal S., Frenzel K.
Features of the electrical conductivity of Fe, Ni, Ti, and Pt nanoisland films: Hysteresis and ion-field processes
Tomilin S.V., Berzhansky V.N., Yanovsky A.S., Tomilina O.A.
Modification of YBa2Cu3O7–δ thin films by ion implantation
Vasiliev V.K., Korolev D.S., Korolev S.A., Masterov D.V., Mikhaylov A.N., Okhapkin A.I., Pavlov S.A., Parafin A.E., Yunin P.A., Skorokhodov E.V., Tetelbaum D.I.
Formation of Oxide Layers on the Surface of Copper and its Alloys Modified by a High-Power Ion Beam
Panova T.V., Kovivchak V.S.
A Comment on the Computer Simulation Program SRIM
Shulga V.I.
Description of the Charge–Energy Distribution of Fast Ions
Novikov N.V., Teplova Y.A.
Features of Ion-Beam Polishing of the Surface of Sapphire
Lunin L.S., Sinel’nikov B.M., Sysoev I.A.
Hydrogen-Permeability of Titanium-Nitride (TiN) Coatings Obtained via the Plasma-Immersion Ion Implantation of Titanium and TiN Vacuum-Arc Deposition on Zr−1%Nb Alloy
Zhang L., Nikitenkov N.N., Sutygina A.N., Kashkarov E.B., Sypchenko V.S., Babihina M.N.
Ion-Beam Synthesis of Ferromagnetic Films by the Implantation of Co+ Ions into Silicon
Chirkov V.V., Gumarov G.G., Petukhov V.Y., Denisov A.E.
Emission theory of amorphous-material sputtering. Energy dependence of the sputtering coefficient
Pustovit A.N.
Modeling of the glow discharge cathode sheath and the cathode surface sputtering in a mixture of argon with mercury vapor
Dubinina M.S., Savichkin D.O., Fisher M.R., Kristya V.I.
Formation of thin oxide layer on surface of copper caused by implantation of high-energy oxygen ions
Khaydukov Y.N., Soltwedel O., Marchenko Y.A., Khaidukova D.Y., Csik A., Acartürk T., Starke U., Keller T., Guglya A.G., Kazdayev K.R.
Fragmentation cross section of 800 A · MeV silicon ions on polyethylene target
Li J., Zhang D.H., Ao H.H., Tian M.M., Feng Z., Sun Y.Q., Kodaira S., Yasuda N.
Chemical composition and atomic structure of the surface of copper–manganese alloy modified with oxygen ions
Surnin D.V., Vorob’ev V.L., Gilmutdinov F.Z., Mukhgalin V.V., Bakieva O.R., Kolotov A.A., Vetoshkin V.M.
Calculation of Ion Reflection from Solids: Computer Simulation and Theory
Tolmachev A.I., Forlano L.
Studying the Emission of X-Ray Quanta, Neutrons, and Charged Particles from Deuterated Structures Irradiated with X-Rays
Dalkarov O.D., Negodaev M.A., Rusetskii A.S., Tsechosh V.I., Lyakhov B.F., Saunin E.I., Bolotokov A.A., Kudryashov I.A.
Simulation of Redeposited Silicon Sputtering under Focused Ion Beam Irradiation
Borgardt N.I., Volkov R.L., Rumyantsev A.V.
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