Research of Memristor Effect in Crossbar Architecture for Neuromorphic Artificial Intelligence Systems

封面

如何引用文章

全文:

开放存取 开放存取
受限制的访问 ##reader.subscriptionAccessGranted##
受限制的访问 订阅存取

详细

This article presents the results of experimental studies of structures formed on the basis of the crossbar architecture of memristor structures made of various materials. TiO2 was used as a working memristor layer. The following materials were used for the contact pads: Al, Ni, Cr, Mo, Ta, Ag. In the course of experimental studies, the optimal combination of materials for the formation of crossbar memristor structures was revealed, which in the future can be used in devices of neuromorphic artificial intelligence systems.

作者简介

V. Polyakova

Southern Federal University

编辑信件的主要联系方式.
Email: vpolyakova@sfedu.ru
俄罗斯联邦, Taganrog

A. Saenko

Southern Federal University

Email: vpolyakova@sfedu.ru
俄罗斯联邦, Taganrog

I. Kots

Southern Federal University

Email: vpolyakova@sfedu.ru
俄罗斯联邦, Taganrog

A. Kovalev

Southern Federal University

Email: vpolyakova@sfedu.ru
俄罗斯联邦, Taganrog

参考

  1. Proydakov E.M. Современное состояние исследований в области искусственного интеллекта // Digital economy. 2018. T. 3. No. 3. P. 50.
  2. Gafarov F.M. Artificial neural networks and applications. Kazan: Kazan, 2018.
  3. Zidan M.A., Strachan J.P., Lu W.D. The future of electronics based on memristive systems // Nat. Electron. 2018. V. 1. P. 22.
  4. Kozhukhov A.S., Scheglov D.V., Fedina L.I., Latyshev A.V. The initial stages of atomic force microscope based local anodic oxidation of silicon AIP Advances 8, 025113 (2018). https://doi.org/10.1063/1.5007914
  5. Colangelo F., Piazza V., Coletti С., Roddaro S., Beltram F., Pingue P. Local anodic oxidation on hydrogen-intercalated graphene layers: oxide composition analysis and role of the silicon carbide substrate. 2 May 2018. https://doi.org/10.1088/1361-6528/aa59c7.
  6. Polyakova V.V., Saenko A.V. Local Anodic Oxidation for Crossbar-Array Architecture Technical Physics. 2022. V. 92. No. 8. Р. 1159–1165.
  7. Rozanov R.Yu., Kondrashov V.A., Nevolin V.K., Chaplygin Yu. A. Development and research of memristors based on metal films of nanoscale thickness // Nanoengineering. 2014. No. 2. Р. 22–28.
  8. Choi B.J., Torrezan A.C., Norris K.J., Miao F. Electrical Performance and Scalability of Pt Dispersed SiO2 Nanometallic Resistance Switch // Nano Lett. 2013. № 13 (7). Р. 3213–3217.

补充文件

附件文件
动作
1. JATS XML
2. Fig. 1. Technological route of crossbar architecture formation

下载 (317KB)
3. Fig. 2. Desktop vacuum magnetron sputtering unit VSE-PVD-DESK-PRO

下载 (288KB)
4. Fig. 3. Solver P47 PRO probe microscope

下载 (236KB)
5. Fig. 4. Schematic of measuring the VAC of a mockup of crossbar memristor structures

下载 (96KB)
6. Fig. 5. Voltampere characteristics of Si/SiO2/Ti/TiO2/Al structure

下载 (108KB)
7. Fig. 6. Voltampere characteristics of Si/SiO2/Ti/TiO2/Ni structure

下载 (95KB)
8. Fig. 7. Voltampere characteristics of Si/SiO2/Ti/TiO2/Cr structure

下载 (114KB)
9. Fig. 8. Voltampere characteristics of Si/SiO2/Ti/TiO2/Mo structure

下载 (132KB)
10. Fig. 9. Voltampere characteristics of Si/SiO2/Ti/TiO2/Ta structure

下载 (155KB)
11. Fig. 10. Voltampere characteristics of Si/SiO2/Ti/TiO2/Ag structure

下载 (123KB)

版权所有 © Russian Academy of Sciences, 2024

##common.cookie##