Mikroèlektronika
ISSN 0544-1269 (Print)
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Author Details
Author Details
Rudenko, K. V.
Issue
Section
Title
File
Vol 52, No 4 (2023)
ТЕХНОЛОГИИ
Mechanisms of the Redistribution of Carbon Contamination in Films Formed by Atomic Layer Deposition
Vol 53, No 1 (2024)
ТЕХНОЛОГИИ
Parameters and Composition of Plasma in a Mixture of CF
4
+ H
2
+ Ar: Effect of the CF
4
/H
2
Ratio
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