Email this article High-Temperature Interaction in the ZrSi2–ZrSiO4 System and Its Mechanism
- Authors: Astapov A.N.1, Lifanov I.P.1, Prokofiev M.V.1
-
Affiliations:
- Moscow Aviation Institute (National Research University)
- Issue: Vol 2019, No 6 (2019)
- Pages: 640-646
- Section: Hardening and Coating Technologies
- URL: https://journals.rcsi.science/0036-0295/article/view/173314
- DOI: https://doi.org/10.1134/S0036029519060065
- ID: 173314
Cite item
Open Access
Access granted
Subscription Access
Abstract
The physicochemical interaction in the ZrSi2–ZrSiO4 system at temperatures higher than 1620°C under the conditions of molecular oxygen deficiency is established and experimentally confirmed. Elemental silicon is reduced simultaneously with the oxidation of zirconium to the thermodynamically stable ZrO2 phase. The mechanism and steps of the interaction processes are proposed.
About the authors
A. N. Astapov
Moscow Aviation Institute (National Research University)
Author for correspondence.
Email: Lexxa1985@inbox.ru
Russian Federation, Moscow, 125993
I. P. Lifanov
Moscow Aviation Institute (National Research University)
Email: Lexxa1985@inbox.ru
Russian Federation, Moscow, 125993
M. V. Prokofiev
Moscow Aviation Institute (National Research University)
Email: Lexxa1985@inbox.ru
Russian Federation, Moscow, 125993
