High-Temperature Interaction in the ZrSi2–ZrSiO4 System and Its Mechanism
- Авторлар: Astapov A.1, Lifanov I.1, Prokofiev M.1
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Мекемелер:
- Moscow Aviation Institute (National Research University)
- Шығарылым: Том 2019, № 6 (2019)
- Беттер: 640-646
- Бөлім: Hardening and Coating Technologies
- URL: https://journals.rcsi.science/0036-0295/article/view/173314
- DOI: https://doi.org/10.1134/S0036029519060065
- ID: 173314
Дәйексөз келтіру
Аннотация
The physicochemical interaction in the ZrSi2–ZrSiO4 system at temperatures higher than 1620°C under the conditions of molecular oxygen deficiency is established and experimentally confirmed. Elemental silicon is reduced simultaneously with the oxidation of zirconium to the thermodynamically stable ZrO2 phase. The mechanism and steps of the interaction processes are proposed.
Негізгі сөздер
Авторлар туралы
A. Astapov
Moscow Aviation Institute (National Research University)
Хат алмасуға жауапты Автор.
Email: Lexxa1985@inbox.ru
Ресей, Moscow, 125993
I. Lifanov
Moscow Aviation Institute (National Research University)
Email: Lexxa1985@inbox.ru
Ресей, Moscow, 125993
M. Prokofiev
Moscow Aviation Institute (National Research University)
Email: Lexxa1985@inbox.ru
Ресей, Moscow, 125993
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